Photomask is known as a critical facilitator for lithographic solutions. Therefore, research is continuing to develop new masks as well as high NA EUV lithography. The demand for the top chip densité has increased, resulting in manufacturers producing high chip density photomasks that enable higher functionality. Because technology is evolving, and new devices have been launched. It also leads to increased investment in innovative techn....
Tags : Photomask , NA EUV lithography , FPD,
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